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Chemical Oxidation of Porous Silicon in

A. Loni, L. Batchelor

2026enporous siliconchemical oxidationsodium hydroxidemethanol solutionspore structuresurface passivation

Abstract

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Porous silicon membranes formed by anodization and electrochemical detachment from the parent wafers are rapidly oxidized at room temperature by immersion in lye solutions comprising methanol and sodium hydroxide (< 0.1 M). The objective of this study is to investigate the effects of immersion time, lye concentration, and alcoholic ratio on the chemical oxidation of porous silicon. The methodology involves measuring reductions in surface area, pore volume, and size, alongside observing color changes and etching susceptibility in dilute hydrofluoric acid. The results reveal that high-porosity membranes can be almost completely converted to white mesoporous silica after only a few minutes of immersion, demonstrating controlled oxidation can significantly enlarge the pores. Passivation of the internal surface of porous silicon is critical for its applications, indicating the relevance of liquid-phase oxidation as an alternative to traditional thermal methods.

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Cite This Work

@article{109adbd9-8901-4e86-a0bd-584a9f7b569c,
  title={Chemical Oxidation of Porous Silicon in},
  author={A. Loni and L. Batchelor},
  year={2026},
  language={en}
}
TY  - JOUR
TI  - Chemical Oxidation of Porous Silicon in
AU  - A. Loni
AU  - L. Batchelor
PY  - 2026
LA  - en
ER  -

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