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Purification of silicon powder by the fo

Marouan Khalifa, Messaoud Hajji

2026ensilicon powderporous siliconvapor etchingthermal annealinggetteringpurification

Abstract

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Porous silicon has been prepared using a vapor-etching based technique on a commercial silicon powder. Strong visible emission was observed in all samples. Obtained silicon powder with a thin porous layer at the surface was subjected to a photo-thermal annealing at different temperatures under oxygen. This process enhances the material's properties and may improve its potential applications in various fields. The findings indicate that the annealing temperature significantly affects the structure and optical characteristics of the silicon powder, providing insights into optimizing the preparation method for enhanced performance. Thus, the study demonstrates the feasibility of using a vapor-etching technique followed by annealing to produce high-quality porous silicon suitable for advanced applications.

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Cite This Work

@article{11418241-820f-4fa3-b9e7-88f3d051f118,
  title={Purification of silicon powder by the fo},
  author={Marouan Khalifa and Messaoud Hajji},
  year={2026},
  language={en}
}
TY  - JOUR
TI  - Purification of silicon powder by the fo
AU  - Marouan Khalifa
AU  - Messaoud Hajji
PY  - 2026
LA  - en
ER  -

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