A. Jagminas, I. Vrublevsky
The composition, structure and electrical properties of alumina barrier layers grown by anodic oxidation in fluoride-containing (FC) and fluoride-free (FF) oxalic acid solutions were studied using the re-anodizing/dissolution technique along with Fourier-transformed infrared and X-ray photoelectron spectroscopy. The results confirmed the formation of films in FC anodizing solutions that are structurally different from those grown in FF oxalic acid baths. It was found that the barrier layer of FC alumina films consists of two layers with distinct dissolution rates. These differences are attributed to the creation in the FC electrolyte of a barrier layer characterized by a more microporous outer part and a thin, non-porous, non-scaloped inner part made up of aluminum oxide and aluminum fluoride. This research sheds light on the structural alterations brought about by fluoride additions, which are critical for the development of mesoporous films and the enhancement of photocatalytic and photovoltaic activities in various applications, including sensors and energy cells.
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title={Composition structure and electrical pro},
author={A. Jagminas and I. Vrublevsky},
year={2026},
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