Z. Abadi, P. Sangpour
Graphene oxide (GO) thin films were simply deposited on fluorine doped tin oxide (FTO) substrate via a low-voltage electrodeposition. The GO and GO thin films were characterized by Zeta Potential, X-ray diffraction, Ultraviolet-Visible spectroscopy, atomic force microscopy, Fourier transform infrared spectroscopy, field emission scanning electron microscopy and energy dispersive X-ray spectroscopy. The results confirm existence of multi-layered graphene oxide. UV-vis spectra exhibit GO thin films possess 60-80% transmittance in the visible region. Calculating optical band gap from UV-vis spectra either for GO solution and GO thin film suggests a simultaneous reduction occurred during deposition.
@article{43f78a3d-191a-440a-b3a3-cdd841b02e9f,
title={Fabrication of Graphene Oxide Thin Films},
author={Z. Abadi and P. Sangpour},
year={2026},
language={en}
}TY - JOUR TI - Fabrication of Graphene Oxide Thin Films AU - Z. Abadi AU - P. Sangpour PY - 2026 LA - en ER -
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