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The electronic properties of sputtered chromium and iron oxide films

G. Goodlet, S. Fatya

2004ensputtered filmscapacitancephotoelectrochemistrypassivitysemiconductivity

Abstract

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The semiconducting properties and electrochemical behaviour of thin chromium and iron oxide films produced by sputtering were investigated by capacitance and photoelectrochemical measurements. The films were deposited onto various substrates and submitted in some cases to a thermal treatment. It appears that sputtered chromium oxide on iron substrate reveals both types of semiconductivity (p and n) and that the thermal treatment enhances the n-type character. Finally, a study is developed using a duplex film formed by sputtered layers of chromium and iron oxides. This system allows for the discussion of the problem of the electronic structure of the heterojunction created by the two kinds of oxides. Comparison is made with the case of passive films on stainless steel.

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Cite This Work

@article{5908166d-cd02-46a4-bab5-a52d0f16e6c8,
  title={The electronic properties of sputtered chromium and iron oxide films},
  author={G. Goodlet and S. Fatya},
  year={2004},
  language={en}
}
TY  - JOUR
TI  - The electronic properties of sputtered chromium and iron oxide films
AU  - G. Goodlet
AU  - S. Fatya
PY  - 2004
LA  - en
ER  -

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