Surface oxidation and H deposition at ru

Current interest in oxidized Ru surfaces arises from the use of RuO2 as a corrosion-resistant electrode material with low overpotential for anodic Cl2 evolution. This study aims to resolve the component processes involved in surface oxidation and hydrogen (H) deposition at ruthenium electrodes using potential-sweep experiments. We employed cyclic voltammetry and linear potential-sweep techniques, focusing on ruthenized platinum (Pt) electrodes prepared through the electroplating of ruthenium (Ru) from ammonium ruthenium chloride solutions. Key findings reveal that traditional cyclic voltammetry leads to an unstructured current-potential profile, lacking clarity in the electrochemical surface properties of Ru electrodes compared to noble metal congeners. However, by adjusting sweep rates and potential holding strategies, we achieved clearer resolution of oxide formation, reduction, and H deposition states. This study highlights the effective methodologies for characterizing Ruthenium surfaces and elucidates their electrochemical behavior, establishing a fundamental understanding necessary for optimizing RuO2 as an electrode material.