I.H. Warren, E. Devuyst
This chapter reviews the physical and chemical aspects of direct leaching of metal oxides, comparing these to recent findings by the authors and their collaborators. Initially, the discussion focuses on the physical factors influencing this process, such as dissolution anisotropy, hydration properties, and the zero point of charge for selected metal oxides. Subsequently, the kinetics of metal oxide dissolution are analyzed, providing insights into the overall reaction dynamics. The authors propose a general mechanism for oxide leaching that effectively accounts for the majority of observed outcomes in existing studies. This synthesis of literature emphasizes the significance of understanding both physical and chemical mechanisms of oxide leaching, which remains crucial not only for extractive metallurgy but also for corrosion studies. The chapter underscores the necessity for further research in this area, particularly given the limited investigations into the kinetics and mechanisms of oxide leaching reactions despite their potential implications for industrial applications.
@article{93f15821-b5b1-41bc-b8bc-1b26aad13160,
title={LEACHING OF METAL OXIDES},
author={I.H. Warren and E. Devuyst},
year={1966},
language={en}
}TY - JOUR TI - LEACHING OF METAL OXIDES AU - I.H. Warren AU - E. Devuyst PY - 1966 LA - en ER -
The leachability tests for manufacturing scrap TV boards (STVB) have indicated the release of metals beyond the limit levels with potential problems f
Printed circuit boards (PCBs) from electronic gadgets at the end of their useful life period are currently being dumped in landfills or incinerated, c
ROPAFADZO JAMAKANGA
Printed circuit boards (PCBs) from electronic gadgets at the end of their useful life period are currently being dumped in landfills or incinerated, c
Ionela Birloaga, Ida De Michelis, Francesco Ferella, Mihai Buzatu, Francesco Vegliò
This study investigates the hydrometallurgical recovery of copper and gold from waste printed circuit boards (WPCBs) using a sequential oxidative leac