Determination and Control of Metallic Im

Electrophoretic deposition (EPD) is a suitable manufacturing method for depositing thin and thick films onto conducting materials. This study aims to investigate the deposition of Al2O3 onto zinc electrodes in water and to analyze the effects of metallic contamination from the electrodes on the ceramic deposits. Utilizing a neodymium:yttrium aluminum garnet (Nd:YAG) laser coupled with an inductively coupled plasma spectrometer, the contamination profiles of the ceramic coatings were determined. The methodology involved varying the current density, deposition time, and slurry properties, such as dispersing state and solids content, to evaluate their impacts on the deposits. Results indicate that by controlling the intensity of the electric field applied to the slurry, as well as adjusting the slurry conductivity and solids content, the contaminating effect of metallic impurities can be significantly reduced. These findings highlight the importance of optimizing processing conditions in EPD to achieve high-quality alumina deposits with minimal contamination.