D. Snyder, P. Sides
The quality of cadmium telluride (CdTe) and its alloy with mercury (Hg1–xCdxTe), deposited through organometallic vapor phase epitaxy (OMVPE), is significantly influenced by the crystallographic orientation of the substrate utilized. This study explores the effects of substrate misorientation on the surface morphology of CdTe films. By examining various substrate orientations and their impact on film quality, notably on CdTe{100} and CdTe{111}, the research presents findings that show superior crystalline quality is often accompanied by poorer surface morphology, characterized by the formation of pyramidal facets. Conversely, films grown on misoriented CdTe{100} substrates showed substantial morphological improvements when misoriented towards the (110) plane. The results indicate that misorienting the substrate can diminish the density of surface facets, thereby enhancing overall film quality. The investigations shed light on the mechanism behind facet formation, suggesting that density and distribution of adsorbed atoms play a crucial role in influencing the final surface characteristics. These insights provide a pathway for optimizing deposition processes in semiconductor manufacturing, accentuating the commercial significance of substrate orientation in improving surface morphology as well as device performance.
@article{c33acdbe-d571-44c0-a501-75026f5b9b09,
title={The morphology of CdTe deposited by orga},
author={D. Snyder and P. Sides},
year={2026},
language={en}
}TY - JOUR TI - The morphology of CdTe deposited by orga AU - D. Snyder AU - P. Sides PY - 2026 LA - en ER -
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