R. M. TORRESI, C. P. DE PAULI
This study investigates the voltametric behaviour of anodic titanium oxide films formed at voltages exceeding 10 V in the cathodic potential region related to the flat-band potential. The objective is to explore how the film morphology influences the electrochemical reactions in this region, particularly when using oxide films of varying thickness, electroformed in 0.5 M H2SO4. Employing a three-layer model for the titanium oxide film, the research discusses the electrochemical reaction dynamics and proposes a comprehensive reaction scheme that elucidates the observed phenomena. This examination is significant due to the growing industrial applications of titanium and highlights the corrosion resistance and potential sensitivity of titanium to adverse conditions. The findings reveal that the anodic oxidation process notably alters the oxide film's characteristics, which resemble those of an extrinsic n-type semiconductor. Additionally, the investigation underscores that in the hydrolysis region, the semiconducting oxide film exhibits metallic behaviour, thereby providing deeper insights into the conduction mechanisms through these oxide films. The outcomes contribute valuable knowledge to ongoing electrochemical studies of titanium and its applications in different media.
@article{c84f824e-eae7-4c4f-bfb4-884fee30fa84,
title={VOLTAMETRIC BEHAVIOUR OF ANODIC TITANIUM OXIDE FILMS CLOSE TO THE HYDROGEN EVOLUTION REACTION},
author={R. M. TORRESI and C. P. DE PAULI},
year={1988},
language={es}
}TY - JOUR TI - VOLTAMETRIC BEHAVIOUR OF ANODIC TITANIUM OXIDE FILMS CLOSE TO THE HYDROGEN EVOLUTION REACTION AU - R. M. TORRESI AU - C. P. DE PAULI PY - 1988 LA - es ER -
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