Factor Effecting Electro-Deposition Process

The growth of the electronic industry and the corresponding demand for its infrastructure improvements necessitates advancements in the electro-deposition process. This study aims to enhance the existing electro-deposition techniques by examining the fundamental aspects influencing the process. Key parameters investigated include the geometry of the path, electrolyte movement, pH level, electro-deposition current, and bath temperature, all of which significantly affect uniformity. The focus is on Titanium oxide plating due to its critical role in the semiconductor industry. A simple lab-scale experiment was conducted to deposit a Titanium oxide coating on a Nickel electrode using a Watts bath. The results reveal that the bath concentration and current density significantly influence the current efficiency of the deposition process. By optimizing the concentration of the plating bath, current density, and anode type, uniformity in the electro-deposition can be greatly enhanced. The study concludes by proposing the optimum conditions necessary for achieving effective electro-deposition.