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Electrodeposition of Silicon from Nonaqu

J. P. Nicholson

2026ensiliconelectrodepositionphotovoltaicssemiconductor

Abstract

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A study of the electrodeposition (ED) of silicon from silicon halides in a nonaqueous electrolyte solution is described. In spite of the use of nonoxidizing electrolytes, the electrodeposits usually become oxidized on air exposure. It is postulated that this is due to the deposits being formed with a sp3 or sp2 mixed bond morphology. However, secondary neutral mass spectrometry (SNMS) and X-ray diffraction (XRD) analyses show that a region of the deposit close to the substrate has sufficient purity for semiconductor properties. This is verified by observing diode behavior in junctions of the deposited layers and mercury contacts. For deposition on crystal silicon substrates, it proved possible to form a p-doped ED-Si/SiC heterojunction which showed a solar cell conversion efficiency of 1.8%. This is probably the first photovoltaic cell which uses electrodeposition as a technique.

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Cite This Work

@article{f2f0f1c6-0bed-446a-8776-a393ccd6da41,
  title={Electrodeposition of Silicon from Nonaqu},
  author={J. P. Nicholson},
  year={2026},
  language={en}
}
TY  - JOUR
TI  - Electrodeposition of Silicon from Nonaqu
AU  - J. P. Nicholson
PY  - 2026
LA  - en
ER  -

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